Louis Å
Louis Å
PE Louis Å
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No | Item | Description |
---|---|---|
1 | Process Type | Thermal Time Divided ALD |
2 | Gases Flow Type | Lateral Type(Traveling Wave) |
3 | Available Thin Film | Metal oxide thin film based DI or O3 Metal nitride thin film based NH3 |
4 | Equipment size (W x L x H) | 780mm x 780mm x 780mm (Standard) |
5 | Base Pressure | < 5 E-3 Torr |
6 | Substrate Size | 8” (ø200) Substrate |
7 | Temperature | Max. 430 ℃ ± 1% (On Set Temperature) |
8 | Number of MFC | Ar 5EA Each of 500 sccm - Precursor delivery 3EA, Precursor dilution 1EA , Reactant dilution 1EA External Gas Reactant Max 3EA 500 sccm (TBD) |
9 | Number of Canister | Max 3EA - Concept #1 : 2 Precursor canister and 1 DI water(Reatant) - Concept #2 : 3 Precursor canister |
10 | Control System | Provided laptop computer & Windows 10 based, advanced and basic GUIs with Import/export of Excel compatible recipes and data |
11 | Gases | All gases regulated more than 4~6 Bar |
12 | Air | CDA, More Than 4~6 Bar |
13 | PCW | PCW, More Than 10LPM (필요 시) |
14 | Power | System : 3Phase , 220V, 60Hz, 30A 이상 |
15 | Vacuum | Recommended Oil rotary pump (>1,000 LPM) |
16 | O3 Generator (Option) | Max 220g/m2 (O2 Gas 1.0LPM) |
COMPANY OVERVIEW
회사명
노피다솔루션
설립연도
2022년 04월
대표이사
조만배
주소
부산광역시 부산진구 전포대로 199번길 15
연락처
051.803.8352
사업자등록번호
123-45-67890